Genuine Windows 7 SPIE Advanced Lithography SPIE

12 - sixteen February 2012
San Jose Convention Middle and San Jose Marriott
San Jose,Genuine Windows 7, California, USA
Participate at SPIE Sophisticated Lithography—an important event (technical program, exhibition,Office Standard 2010 Key, courses, networking events) for optical lithography, resists, metrology, EUV,Office Pro, design, and more.
Technical Program Information: •2012 Call for Papers will begin in April •View 2011 Final Technical Program (PDF) •View 2011 conference abstracts (PDF) •View 2011 proceedings (on SPIE Digital Library)Exhibition Information: •Interested in exhibiting? Learn more about the Exhibition •Become an Exhibitor: View 2012 Exhibitor Contract (PDF) •Returning exhibitors: Contact SPIE Sales for an early-bird contractSPIE Innovative Lithography is:•Over 550 technical presentations•A 50-company+ exhibition for the industry’s top semiconductor suppliers, integrators,microsoft Office 2010 Activation, and manufacturers.•twelve courses - including EUV Lithography, Practical Photoresist Processing, and Electron Beam Inspection.•Panel Discussions, Awards,Office Ultimate 2007, Workshops•Social and Networking Events•2011 Plenary Presentations
Extreme Technology for a Sustainable World
Luc Van den hove,
President and CEO, IMEC (Belgium)

Thoughts on Extending Moore's Law
in the New Decade
Shang-Yi Chiang,
Senior VP, Taiwan Semiconductor (Taiwan)
SPIE Sophisticated Lithography concluded on Thursday 3 March 2011. The overall conference attendance increased 11% this year. It's exciting to see the semiconductor industry bouncing back. Thanks to everyone who helped to make this event a success.
Quote of the Day: “I came up to visit the exhibition and discovered some things I didn't even know existed and ideas I hadn't thought of before. This is a great place to meet smart people." - Brent Bergner, Spectrum Scientific
Thank you for joining us at SPIE Advance Lithography 2011. See you in 2012.
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