Office Professional Plus 2007 Key SPIE Advanced Li

twelve - sixteen February 2012
San Jose Convention Center and San Jose Marriott
San Jose, California,Microsoft Office 2007 Ultimate, USA
Participate at SPIE Superior Lithography—an important event (technical program, exhibition, courses, networking events) for optical lithography, resists, metrology, EUV, design,Office 2010 Pro, and more.
Technical Program Information: •2012 Call for Papers will begin in April •View 2011 Final Technical Program (PDF) •View 2011 conference abstracts (PDF) •View 2011 proceedings (on SPIE Digital Library)Exhibition Information: •Interested in exhibiting? Learn more about the Exhibition •Become an Exhibitor: View 2012 Exhibitor Contract (PDF) •Returning exhibitors: Contact SPIE Sales for an early-bird contractSPIE Sophisticated Lithography is:•Over 550 technical presentations•A 50-company+ exhibition for the industry’s top semiconductor suppliers, integrators, and manufacturers.•twelve courses - including EUV Lithography,Office Pro Plus 2007 Key, Practical Photoresist Processing,Office Standard 2010, and Electron Beam Inspection.•Panel Discussions, Awards, Workshops•Social and Networking Events•2011 Plenary Presentations
Extreme Technology for a Sustainable World
Luc Van den hove,
President and CEO,Office Professional Plus 2007 Key, IMEC (Belgium)

Thoughts on Extending Moore's Law
in the New Decade
Shang-Yi Chiang,
Senior VP, Taiwan Semiconductor (Taiwan)
SPIE Advanced Lithography concluded on Thursday 3 March 2011. The overall conference attendance increased 11% this year. It's exciting to see the semiconductor industry bouncing back. Thanks to everyone who helped to make this event a success.
Quote of the Day: “I came up to visit the exhibition and discovered some things I didn't even know existed and ideas I hadn't thought of before. This is a great place to meet smart people." - Brent Bergner, Spectrum Scientific
Thank you for joining us at SPIE Advance Lithography 2011. See you in 2012.
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